High-resolution Fourier-transform IR spectroscopic determination of impurities in silicon tetrafluoride and silane prepared from it

The impurity compositions of silicon tetrafluoride and silane prepared from it have been determined by high-resolution Fourier-transform IR spectroscopy. In the spectra of SiF4 samples differing in purity, we have identified rovibrational bands arising from Si2F6O, SiF3OH, HF, SiF3H, SiF2H2, SiH3F,...

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Veröffentlicht in:Inorganic materials 2006-08, Vol.42 (8), p.924-931
Hauptverfasser: Chuprov, L. A., Sennikov, P. G., Tokhadze, K. G., Ignatov, S. K., Schrems, O.
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Sprache:eng
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Zusammenfassung:The impurity compositions of silicon tetrafluoride and silane prepared from it have been determined by high-resolution Fourier-transform IR spectroscopy. In the spectra of SiF4 samples differing in purity, we have identified rovibrational bands arising from Si2F6O, SiF3OH, HF, SiF3H, SiF2H2, SiH3F, CH4, CO2, and CO impurities. Their detection limits lie in the range 9 X 10 (CO2) to 3 X 10 mol % (Si2F6O). In the spectra of SiH4 samples of different purity, we have detected CH4, CO2, SiF3H, SiF2H2, and SiF4 impurities. Their detection limits lie in the range 8 X 10 (CO2) to 1 X 10 mol % (SiF4).
ISSN:0020-1685
1608-3172
DOI:10.1134/S0020168506080231