On the incorporation mechanism of Fe in GaN grown by metal-organic vapour phase epitaxy

We report an investigation of the incorporation mechanism of iron (Fe) as a dopant in GaN grown by MOVPE. A series of Fe doped GaN structures were studied by secondary ion mass spectrometry (SIMS), atomic force microscopy (AFM) and X‐ray photo‐electron spectroscopy (XPS). A model is presented which...

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Veröffentlicht in:Physica status solidi. C 2006-06, Vol.3 (6), p.1429-1434
Hauptverfasser: Balmer, R. S., Soley, D. E. J., Simons, A. J., Mace, J. D., Koker, L., Jackson, P. O., Wallis, D. J., Uren, M. J., Martin, T.
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Sprache:eng
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Zusammenfassung:We report an investigation of the incorporation mechanism of iron (Fe) as a dopant in GaN grown by MOVPE. A series of Fe doped GaN structures were studied by secondary ion mass spectrometry (SIMS), atomic force microscopy (AFM) and X‐ray photo‐electron spectroscopy (XPS). A model is presented which describes the SIMS concentration profiles with excellent agreement, and, it is shown that Fe incorporation into GaN occurs via a surface segregation mechanism. This model is supported by direct measurement of a highly Fe‐rich layer on the surface of Fe doped GaN by XPS. Furthermore, we find that the presence of Fe on the GaN surface promotes a transition from 2D to 3D GaN growth which is confirmed by AFM measurements of RMS roughness with increasing Fe flux. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
ISSN:1862-6351
1610-1634
1610-1642
DOI:10.1002/pssc.200565282