Energy Distribution of Electrons Emitted from Silicon Field Emitter Arrays
We propose the application of silicon field emitter array (Si-FEA) to resolve the problem of wafer charging in the ion implantation process. This article reports experiments conducted to review the basic property of Si-FEA. This time, we measured the energy distribution of electrons emitted from thr...
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Veröffentlicht in: | Shinku 2005, Vol.48(5), pp.329-332 |
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Hauptverfasser: | , , , , , , , , |
Format: | Artikel |
Sprache: | eng ; jpn |
Online-Zugang: | Volltext |
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Zusammenfassung: | We propose the application of silicon field emitter array (Si-FEA) to resolve the problem of wafer charging in the ion implantation process. This article reports experiments conducted to review the basic property of Si-FEA. This time, we measured the energy distribution of electrons emitted from three types of Si-FEA with different number of tips and gate apertures. The result is different from that of platinum field emitter array (Pt-FEA) in some points. First, half bandwidth of Si-FEA distribution is a little smaller than that of Pt-FEA. Second, the energy peak of Si-FEA shifts to lower energy side from Fermi level. Such phenomenon doesn't happen in the energy distribution of Pt-FEA. |
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ISSN: | 0559-8516 1880-9413 |
DOI: | 10.3131/jvsj.48.329 |