Energy Distribution of Electrons Emitted from Silicon Field Emitter Arrays

We propose the application of silicon field emitter array (Si-FEA) to resolve the problem of wafer charging in the ion implantation process. This article reports experiments conducted to review the basic property of Si-FEA. This time, we measured the energy distribution of electrons emitted from thr...

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Veröffentlicht in:Shinku 2005, Vol.48(5), pp.329-332
Hauptverfasser: KOJIMA, Toshihiko, NAKAMURA, Kouji, GOTOH, Yasuhito, TSUJI, Hiroshi, ISHIKAWA, Junzo, IKEJIRI, Tadashi, UMISEDO, Sei, SAKAI, Shigeki, NAGAI, Nobuo
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Sprache:eng ; jpn
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Zusammenfassung:We propose the application of silicon field emitter array (Si-FEA) to resolve the problem of wafer charging in the ion implantation process. This article reports experiments conducted to review the basic property of Si-FEA. This time, we measured the energy distribution of electrons emitted from three types of Si-FEA with different number of tips and gate apertures. The result is different from that of platinum field emitter array (Pt-FEA) in some points. First, half bandwidth of Si-FEA distribution is a little smaller than that of Pt-FEA. Second, the energy peak of Si-FEA shifts to lower energy side from Fermi level. Such phenomenon doesn't happen in the energy distribution of Pt-FEA.
ISSN:0559-8516
1880-9413
DOI:10.3131/jvsj.48.329