Patterning of Thin-Film Microstructures on Non-Planar Substrate Surfaces Using Decal Transfer Lithography

Soft‐lithographic patterning of thin‐film material microstructures supported on spherically curved lenses (see Figure) using an extension of decal transfer lithography (DTL) is reported. These processes have been used to successfully create a pattern of amorphous silicon and gold thin‐film microstructures with feature sizes ranging from 2 μm to 75 μm. This has been achieved without noticeable defects using wet and reactive‐ion etching processes across large substrate areas.