Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology

This paper describes a noncontact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions, patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks th...

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Veröffentlicht in:	IEEE transactions on semiconductor manufacturing 2004-02, Vol.17 (1), p.25-34
Hauptverfasser:	Guillaume, N.M.P., Allen, R.A., Cresswell, M.W., Lahti, M., Linholm, L.W., Zaghloul, M.E.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Atomic force microscopy Capacitive sensors Ceramics Costs Dimensional measurements Electronics Exact sciences and technology Lithography Metrology Microelectronic fabrication (materials and surfaces technology) Optical microscopy Optical sensors Photomasks Reticles Scanning electron microscopy Semiconductor devices Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Semiconductors Sensors Temperature sensors Testing, measurement, noise and reliability
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Beschreibung
Zusammenfassung:	This paper describes a noncontact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions, patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks that facilitate linewidth metrology with the new sensor. The metrology sensor is fabricated using a low temperature co-fired ceramic technology and its principle is based on noncontact microcapacitance measurements of features on chrome-on-glass reticles.
ISSN:	0894-6507 1558-2345
DOI:	10.1109/TSM.2003.822736