A novel method for the production of aluminium nitride

A novel method for the production of aluminium nitride

A method has been developed to produce thick (>400 μm) AlN surface layers on aluminium plates at 540 °C, under nitrogen at atmospheric pressure. A critical element of the process is the use of Mg powder placed in close proximity to the Al plate surface. The Mg reduces/disrupts the natural, protec...

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Veröffentlicht in:Scripta materialia 2006-06, Vol.54 (12), p.2125-2129
Hauptverfasser: Kent, D., Schaffer, G.B., Sercombe, T.B., Drennan, J.
Format: Artikel
Sprache:eng
Schlagworte:
Aluminium
Aluminium nitride
Aluminum
Applied sciences
Barometric pressure
Exact sciences and technology
Magnesium
Metals. Metallurgy
Nitrides
Oxide coatings
Plates
Surface layer
Thin films
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Beschreibung
Zusammenfassung:A method has been developed to produce thick (>400 μm) AlN surface layers on aluminium plates at 540 °C, under nitrogen at atmospheric pressure. A critical element of the process is the use of Mg powder placed in close proximity to the Al plate surface. The Mg reduces/disrupts the natural, protective oxide film on the Al surface. The nitride layers form through two distinct modes, one growing outward from the Al plate surface and the other growing into the Al.
ISSN:1359-6462
0956-716X
1872-8456
DOI:10.1016/j.scriptamat.2006.02.047