Electrical Performance of GaN Schottky Rectifiers on Si Substrates

Schottky rectifiers fabricated on GaN layers grown on 4 in. diam Si substrates show breakdown voltages (V(R)) of ~300 V at room temperature, on-state resistances (R(ON)) of 40 mOmega cm2, and figure-of-merit (V(B))2/S(ON) of 2.25 MW/cm2. The reverse current is thermally activated with activation ene...

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Veröffentlicht in:Journal of the Electrochemical Society 2006-01, Vol.153 (7), p.G681-G684
Hauptverfasser: Voss, L., Pearton, S. J., Ren, F., Bove, P., Lahreche, H., Thuret, J.
Format: Artikel
Sprache:eng
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Zusammenfassung:Schottky rectifiers fabricated on GaN layers grown on 4 in. diam Si substrates show breakdown voltages (V(R)) of ~300 V at room temperature, on-state resistances (R(ON)) of 40 mOmega cm2, and figure-of-merit (V(B))2/S(ON) of 2.25 MW/cm2. The reverse current is thermally activated with activation energies in the range 0.3-0.4 eV and is proportional to contact perimeter at reverse biases up to ~100 V. This approach provides a low-cost alternative to GaN rectifiers on sapphire or SiC substrates while still maintaining good breakdown characteristics.
ISSN:0013-4651
DOI:10.1149/1.2202146