Electrical Performance of GaN Schottky Rectifiers on Si Substrates
Schottky rectifiers fabricated on GaN layers grown on 4 in. diam Si substrates show breakdown voltages (V(R)) of ~300 V at room temperature, on-state resistances (R(ON)) of 40 mOmega cm2, and figure-of-merit (V(B))2/S(ON) of 2.25 MW/cm2. The reverse current is thermally activated with activation ene...
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Veröffentlicht in: | Journal of the Electrochemical Society 2006-01, Vol.153 (7), p.G681-G684 |
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Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | Schottky rectifiers fabricated on GaN layers grown on 4 in. diam Si substrates show breakdown voltages (V(R)) of ~300 V at room temperature, on-state resistances (R(ON)) of 40 mOmega cm2, and figure-of-merit (V(B))2/S(ON) of 2.25 MW/cm2. The reverse current is thermally activated with activation energies in the range 0.3-0.4 eV and is proportional to contact perimeter at reverse biases up to ~100 V. This approach provides a low-cost alternative to GaN rectifiers on sapphire or SiC substrates while still maintaining good breakdown characteristics. |
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ISSN: | 0013-4651 |
DOI: | 10.1149/1.2202146 |