Electron–electron interaction in p-SiGe/Ge quantum wells
The temperature dependent magnetoresistance of high mobility p-SiGe/Ge quantum wells is studied with hole densities ranging from 1.7 to 5.9 × 10 11 cm −2. At magnetic fields below the onset of quantum oscillations that reflect the high mobility values (up to 75000 cm 2/Vs), we observe the clear sign...
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Veröffentlicht in: | Materials science & engineering. B, Solid-state materials for advanced technology Solid-state materials for advanced technology, 2005-12, Vol.124, p.184-187 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | The temperature dependent magnetoresistance of high mobility p-SiGe/Ge quantum wells is studied with hole densities ranging from 1.7 to 5.9
×
10
11
cm
−2. At magnetic fields below the onset of quantum oscillations that reflect the high mobility values (up to 75000
cm
2/Vs), we observe the clear signatures of electron–electron interaction. We compare our experiment with the theory of electron–electron interaction including the Zeeman band splitting. The observed magnetoresistance is well explained as a superposition of band structure induced positive magnetoresistance and the negative magntoresistance due to the electron–electron interaction effect. |
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ISSN: | 0921-5107 1873-4944 |
DOI: | 10.1016/j.mseb.2005.08.037 |