Electron–electron interaction in p-SiGe/Ge quantum wells

The temperature dependent magnetoresistance of high mobility p-SiGe/Ge quantum wells is studied with hole densities ranging from 1.7 to 5.9 × 10 11 cm −2. At magnetic fields below the onset of quantum oscillations that reflect the high mobility values (up to 75000 cm 2/Vs), we observe the clear sign...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Materials science & engineering. B, Solid-state materials for advanced technology Solid-state materials for advanced technology, 2005-12, Vol.124, p.184-187
Hauptverfasser: Rössner, Benjamin, von Känel, Hans, Chrastina, Daniel, Isella, Giovanni, Batlogg, Bertram
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The temperature dependent magnetoresistance of high mobility p-SiGe/Ge quantum wells is studied with hole densities ranging from 1.7 to 5.9 × 10 11 cm −2. At magnetic fields below the onset of quantum oscillations that reflect the high mobility values (up to 75000 cm 2/Vs), we observe the clear signatures of electron–electron interaction. We compare our experiment with the theory of electron–electron interaction including the Zeeman band splitting. The observed magnetoresistance is well explained as a superposition of band structure induced positive magnetoresistance and the negative magntoresistance due to the electron–electron interaction effect.
ISSN:0921-5107
1873-4944
DOI:10.1016/j.mseb.2005.08.037