Ultraflat Ternary Nanopatterns Fabricated Using Colloidal Lithography

Ultraflat Ternary Nanopatterns Fabricated Using Colloidal Lithography

Colloidal lithography on mica has been combined with subsequent thermal evaporation, sputtering, and template‐stripping processes to produce ultraflat ternary nanopatterns of large lateral extension (see Figure). The resulting surface is particularly useful for applications that demand proper distin...

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Veröffentlicht in:Advanced materials (Weinheim) 2006-02, Vol.18 (4), p.421-426
Hauptverfasser: Wright, J. P., Worsfold, O., Whitehouse, C., Himmelhaus, M.
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Sprache:eng
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Lithography
Monolayers
Nanopatterning
Template-directed assembly
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container_end_page 426
container_issue 4
container_start_page 421
container_title Advanced materials (Weinheim)
container_volume 18
creator Wright, J. P.
Worsfold, O.
Whitehouse, C.
Himmelhaus, M.
description Colloidal lithography on mica has been combined with subsequent thermal evaporation, sputtering, and template‐stripping processes to produce ultraflat ternary nanopatterns of large lateral extension (see Figure). The resulting surface is particularly useful for applications that demand proper distinction between complex surface chemistry and topography.
doi_str_mv 10.1002/adma.200502188
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source Wiley Online Library Journals Frontfile Complete
subjects Lithography
Monolayers
Nanopatterning
Template-directed assembly
title Ultraflat Ternary Nanopatterns Fabricated Using Colloidal Lithography
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