Ultraflat Ternary Nanopatterns Fabricated Using Colloidal Lithography

Ultraflat Ternary Nanopatterns Fabricated Using Colloidal Lithography

Colloidal lithography on mica has been combined with subsequent thermal evaporation, sputtering, and template‐stripping processes to produce ultraflat ternary nanopatterns of large lateral extension (see Figure). The resulting surface is particularly useful for applications that demand proper distin...

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Veröffentlicht in:Advanced materials (Weinheim) 2006-02, Vol.18 (4), p.421-426
Hauptverfasser: Wright, J. P., Worsfold, O., Whitehouse, C., Himmelhaus, M.
Format: Artikel
Sprache:eng
Schlagworte:
Lithography
Monolayers
Nanopatterning
Template-directed assembly
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Zusammenfassung:Colloidal lithography on mica has been combined with subsequent thermal evaporation, sputtering, and template‐stripping processes to produce ultraflat ternary nanopatterns of large lateral extension (see Figure). The resulting surface is particularly useful for applications that demand proper distinction between complex surface chemistry and topography.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200502188