Electrical and optical properties of highly (001) textured WSX films deposited by reactive magnetron sputtering

Electrical and optical properties of highly (001) textured WSX films deposited by reactive magnetron sputtering

Highly (001) textured polycrystalline WSx films (1.2≤x≤2.0) were prepared by reactive magnetron sputtering from a tungsten target in a mixture of argon and H2S. The total sputtering pressure was varied from 0.3 to 9.0 Pa. From temperature dependent conductivity measurements (80≤T≤295 K) it follows t...

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Veröffentlicht in:Surface & coatings technology 2005-10, Vol.200 (1-4), p.218-221
Hauptverfasser: Seeger, S., Mientus, R., Röhrich, J., Strub, E., Bohne, W., Ellmer, K.
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
Conductivity
Cross-disciplinary physics: materials science
rheology
Energy-dispersive X-ray diffraction
Exact sciences and technology
Magnetron sputtering
Materials science
Metals. Metallurgy
Other topics in materials science
Physics
Production techniques
Surface treatment
Tungsten disulfide
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Beschreibung
Zusammenfassung:Highly (001) textured polycrystalline WSx films (1.2≤x≤2.0) were prepared by reactive magnetron sputtering from a tungsten target in a mixture of argon and H2S. The total sputtering pressure was varied from 0.3 to 9.0 Pa. From temperature dependent conductivity measurements (80≤T≤295 K) it follows that the films deposited at sputtering pressures p
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2005.02.050