Selectively etched tunnel junction for lateral current and optical confinement in InP-based vertical cavity lasers

We demonstrate a thin, selectively lateral-etched, Alln(Ga)As tunnel junction (TJ) layer as a current and optical confinement aperture in the InP-based long-wavelength vertical cavity surface-emitting lasers (VCSELs). A high etch selectivity was demonstrated by etching the aperture a distance of sev...

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Veröffentlicht in:Journal of electronic materials 2004-02, Vol.33 (2), p.118-122, Article 118
Hauptverfasser: REDDY, M. H. M, ASANO, T, FEEZELL, D, BUELL, D. A, HUNTINGTON, A. S, KODA, R, COLDREN, L. A
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Sprache:eng
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