Elaboration of 1 mum square arrays of octadecyltrimethoxysilane monolayers on SiO2 /Si by combining chemical vapour deposition and nano-imprint lithography

Local chemical grafting of OctadecylTriMethoxySilane (OTMS) on SiO2/Si substrates has been successfully performed on specific micrometric areas by combining nano-imprint lithography and Chemical Vapour Deposition (CVD). The optimization of the CVD experimental conditions using atomic force microscop...

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Veröffentlicht in:Superlattices and microstructures 2004-07, Vol.36 (1-3), p.227-233
Hauptverfasser: Lhuillier, Jean-Baptiste, Martin, Christel, Ressier, Laurence, Peyrade, Jean Pierre, Grisolia, Jeremie, Respaud, Marc
Format: Artikel
Sprache:eng
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