Elaboration of 1 mum square arrays of octadecyltrimethoxysilane monolayers on SiO2 /Si by combining chemical vapour deposition and nano-imprint lithography
Local chemical grafting of OctadecylTriMethoxySilane (OTMS) on SiO2/Si substrates has been successfully performed on specific micrometric areas by combining nano-imprint lithography and Chemical Vapour Deposition (CVD). The optimization of the CVD experimental conditions using atomic force microscop...
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Veröffentlicht in: | Superlattices and microstructures 2004-07, Vol.36 (1-3), p.227-233 |
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Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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