Elaboration of 1 mum square arrays of octadecyltrimethoxysilane monolayers on SiO2 /Si by combining chemical vapour deposition and nano-imprint lithography

Elaboration of 1 mum square arrays of octadecyltrimethoxysilane monolayers on SiO2 /Si by combining chemical vapour deposition and nano-imprint lithography

Local chemical grafting of OctadecylTriMethoxySilane (OTMS) on SiO2/Si substrates has been successfully performed on specific micrometric areas by combining nano-imprint lithography and Chemical Vapour Deposition (CVD). The optimization of the CVD experimental conditions using atomic force microscop...

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Veröffentlicht in:Superlattices and microstructures 2004-07, Vol.36 (1-3), p.227-233
Hauptverfasser: Lhuillier, Jean-Baptiste, Martin, Christel, Ressier, Laurence, Peyrade, Jean Pierre, Grisolia, Jeremie, Respaud, Marc
Format: Artikel
Sprache:eng
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Zusammenfassung:Local chemical grafting of OctadecylTriMethoxySilane (OTMS) on SiO2/Si substrates has been successfully performed on specific micrometric areas by combining nano-imprint lithography and Chemical Vapour Deposition (CVD). The optimization of the CVD experimental conditions using atomic force microscopy has lead to homogeneous 1mum square arrays of OTMS monolayers on millimetric areas.
ISSN:0749-6036
1096-3677
DOI:10.1016/j.spmi.2004.08.040