Lattice parameters of relaxed wurtzite indium nitride powder obtained by MOCVD
We have grown by metal–organic chemical vapour deposition a thick layer of indium nitride (1.4 μm) on a sapphire substrate using appropriate growth parameters. The substrate was then removed and the layer reduced to powder by a soft mechanical method. The resulting material was used to obtain an X-r...
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Veröffentlicht in: | Superlattices and microstructures 2004-10, Vol.36 (4), p.527-535 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | We have grown by metal–organic chemical vapour deposition a thick layer of indium nitride (1.4 μm) on a sapphire substrate using appropriate growth parameters. The substrate was then removed and the layer reduced to powder by a soft mechanical method. The resulting material was used to obtain an X-ray powder diffraction profile for completely relaxed indium nitride, i.e. without strain due to the lattice mismatch with sapphire. The diffraction measurement was made with a Phillips XPERT-Pro diffractometer, without slits, and collected using
CuK
α
radiation at 300 K.
The powder pattern contains many (
h
k
l
) peaks, depending upon two lattice parameters,
a
and
c
, for the wurtzite crystal structure. A two-dimensional least squares procedure was adapted to minimize the fitting errors on the experimental data. The lattice parameters were accurately extracted and will be given here. |
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ISSN: | 0749-6036 1096-3677 |
DOI: | 10.1016/j.spmi.2004.09.052 |