Growth and characterization of ZnTe epilayers on (1 0 0) GaAs substrates by metalorganic vapor phase epitaxy

ZnTe films were grown on (1 0 0) GaAs substrates by metalorganic vapor phase epitaxy using dimethylzinc and diethyltelluride as the source materials. It was found that epitaxial ZnTe layers can be obtained on (1 0 0) GaAs substrates, and the crystal quality of the ZnTe layers depends strongly on the...

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Veröffentlicht in:Journal of crystal growth 2007, Vol.298, p.445-448
Hauptverfasser: Kume, Yusuke, Guo, Qixin, Fukuhara, Yuji, Tanaka, Tooru, Nishio, Mitsuhiro, Ogawa, Hiroshi
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Sprache:eng
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Zusammenfassung:ZnTe films were grown on (1 0 0) GaAs substrates by metalorganic vapor phase epitaxy using dimethylzinc and diethyltelluride as the source materials. It was found that epitaxial ZnTe layers can be obtained on (1 0 0) GaAs substrates, and the crystal quality of the ZnTe layers depends strongly on the substrate temperature. A high-crystalline-quality ZnTe heteroepitaxial layer with 103 arcsec of the full-width at half-maximum value of the X-ray rocking curve for (4 0 0) reflection, was obtained in this experiment at the substrate temperature of 430 °C.
ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2006.10.054