Advanced Charge Control for Single Wafer Implanters

Supplying low energy electrons to insure neutralization of implanted wafers requires an advanced charge control system. Some devices are extremely sensitive to low levels of metal contamination. We have designed a radio frequency (rf) plasma flood gun that eliminates the use of a hot filament. This makes this PFG more reliable and not susceptible to filament failures. We will present data showing that this advanced PFG has excellent charge control with an electron energy distribution that floods the wafer with an abundant supply of low energy electrons.