FIB-milling of photonic structures and sputtering simulation

Focused ion beam milling is used first to sputter simple geometric structures to investigate sputter depth dependence on parameters like ion fluence, beam diameter, and scanning strategy and second to structure photonic crystal etching masks and Fresnel micro-lenses in various materials. Computer simulation of specific scanning strategies is performed to achieve the highest possible precision with respect to the initial design and to obtain controllable and reproducible milling processes.