Control of Electron Density and Temperature with a Modified Capacitive Discharge
We propose a new type of capacitive plasma source with a mesh grid to solve the problems of previous low pressure discharges, the inability to control the electron density and temperature independently, i.e. just one value of electron temperature is possible for a given electron density. While varyi...
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Veröffentlicht in: | Plasma chemistry and plasma processing 2005-06, Vol.25 (3), p.245-254 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | We propose a new type of capacitive plasma source with a mesh grid to solve the problems of previous low pressure discharges, the inability to control the electron density and temperature independently, i.e. just one value of electron temperature is possible for a given electron density. While varying the grid bias and the discharge current, various electron temperatures are possible for a given electron density, and the electron density and temperature can be controlled from 4 x 108cm-3 to 1 x 1010 cm-3 and from 1 to 4 eV; respectively. |
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ISSN: | 0272-4324 1572-8986 |
DOI: | 10.1007/s11090-004-3038-6 |