SiC Coatings Deposited by RF Magnetron Sputtering
Amorphous SiC coatings were deposited by RF magnetron sputtering from a sintered SiC target onto Si(100) substrate at room temperature. The influence of RF power on the surface morphology and the RMS surface roughness of the resulting SiC coatings was studied by using atomic force microscopy. Two ty...
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| Veröffentlicht in: | Key Engineering Materials 2005-01, Vol.280-283, p.1309-1312 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | Amorphous SiC coatings were deposited by RF magnetron sputtering from a sintered SiC target onto Si(100) substrate at room temperature. The influence of RF power on the surface morphology and the RMS surface roughness of the resulting SiC coatings was studied by using atomic force microscopy.
Two types of surface morphologies were obtained. The corresponding forming mechanisms were also discussed. |
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| ISSN: | 1013-9826 1662-9795 1662-9795 |
| DOI: | 10.4028/www.scientific.net/KEM.280-283.1309 |