Optical properties and photoconductivity of amorphous silicon carbon nitride thin film and its application for UV detection

Optical properties of amorphous silicon carbon nitride thin films as a function of carbon content have been studied by the spectral micro-reflectometry. The compositions of a-SiCN thin films deposited with different CH 4 flow rates were analyzed by X-ray photoemission spectroscopy (XPS). It was foun...

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Veröffentlicht in:Diamond and related materials 2005-03, Vol.14 (3), p.1010-1013
Hauptverfasser: Chen, C.W., Huang, C.C., Lin, Y.Y., Chen, L.C., Chen, K.H., Su, W.F.
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Sprache:eng
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Zusammenfassung:Optical properties of amorphous silicon carbon nitride thin films as a function of carbon content have been studied by the spectral micro-reflectometry. The compositions of a-SiCN thin films deposited with different CH 4 flow rates were analyzed by X-ray photoemission spectroscopy (XPS). It was found that the transmittance of a-SiCN thin films decreases with the increasing carbon content; the index of refraction n varies from ∼2.0 to ∼2.2 and the optical gap (Tauc gap) E opt value progressively decreases from 4.1 to 3.3 eV while the carbon content changes from 0 to 25% in the films. In addition, a MSM (metal-semiconductor-metal) photodetector device based on the a-SiCN thin film demonstrates excellent selective sensing features with a large photo-to-dark current ratio about 1800 under illumination of the 250 nm UV light source, providing potential applications for low-cost UV detection.
ISSN:0925-9635
1879-0062
DOI:10.1016/j.diamond.2004.11.027