Composite Platinum/Silicon Dioxide Films Deposited using CVD

We report the low temperature deposition of platinum/silicon dioxide composite films from tetraethylorthosilicate (TEOS) and platinum acetylacetonate (Pt(acac)2). The simultaneous CVD of TEOS and Pt(acac)2, in the presence of oxygen, has been shown to reduce the decomposition temperature of TEOS to...

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Veröffentlicht in:	Chemical vapor deposition 2005-03, Vol.11 (3), p.170-174
Hauptverfasser:	Martin, T. P., Tripp, C. P., DeSisto, W. J.
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Composite materials Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Platinum Silicon oxides Thin films
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