Negative Capacitance and Dielectric Constant of Nanocomposite SiAlzOxNy(Si) Films with Semiconductor Nanoparticles
The electrical properties of nanocomposite SiAlzOxNy(Si) films containing Si nanoclusters embedded into amorphous SiAlzOxNy matrix have been studied by measurements of DC current-voltage and AC capacitance-voltage characteristics. Analysis of the results allowed us to conclude the existence of a neg...
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Veröffentlicht in: | Nano letters 2024-01, Vol.24 (2), p.617-622 |
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Hauptverfasser: | , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The electrical properties of nanocomposite SiAlzOxNy(Si) films containing Si nanoclusters embedded into amorphous SiAlzOxNy matrix have been studied by measurements of DC current-voltage and AC capacitance-voltage characteristics. Analysis of the results allowed us to conclude the existence of a negative dielectric constant. The temperature dependence of the negative dielectric constant has been obtained and analyzed. The negative capacitance has been revealed during measurements of capacitance-voltage characteristics at testing signal frequency of 2 kHz. The negative capacitance also points out the appearance of a negative dielectric constant effect. The qualitative model for explanation of negative dielectric constant based on peculiarities of SiAlzOxNy(Si) films polarization due to electron capture at Si nanoparticles-amorphous SiAlzOxNy matrix interface traps near cathode region has been proposed. In the case of AC C-U measurements, a negative capacitance is observed if conductivity current through the nanocomposite film is relatively high. |
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ISSN: | 1530-6992 |
DOI: | 10.1021/acs.nanolett.3c03627 |