Very high voltage operation (>330 V) with high current gain of AlGaN/GaN HBTs

N-p-n Al/sub 0.05/GaN/GaN heterojunction bipolar transistors with a common emitter operation voltage higher than 330 V have been demonstrated using selectively regrown emitters. Devices were grown by metalorganic chemical vapor deposition on sapphire substrates. The n-type emitter was grown selectiv...

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Veröffentlicht in:IEEE electron device letters 2003-03, Vol.24 (3), p.141-143
Hauptverfasser: Huili Xing, Chavarkar, P.M., Keller, S., DenBaars, S.P., Mishra, U.K.
Format: Artikel
Sprache:eng
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Zusammenfassung:N-p-n Al/sub 0.05/GaN/GaN heterojunction bipolar transistors with a common emitter operation voltage higher than 330 V have been demonstrated using selectively regrown emitters. Devices were grown by metalorganic chemical vapor deposition on sapphire substrates. The n-type emitter was grown selectively on a 100-nm-thick p-base with an 8 μm n-collector structure using a dielectric mask. The shallow etch down to the collector mitigates damages induced in the dry etch, resulting a low leakage and a high breakdown. The graded AlGaN emitter results in a common emitter current gain of /spl sim/18 at an average collector current density of up to 1 kA/cm 2 at room temperature.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2003.811400