Tension-Induced Localized Wrinkling in a Patched Thin Film Supported by an Elastomer

The wrinkling behavior of thin films has received great attention for their applications in developing various wrinkle-based novel technologies. Herein, a new wrinkling system: tension-induced wrinkling in an elastomer-supported patched thin film (TW-P&SF) is investigated by using PDMS-supported...

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Veröffentlicht in:Langmuir 2024-01, Vol.40 (1), p.133-140
Hauptverfasser: Gao, Fan, Yao, Yanbo, Liu, Tao
Format: Artikel
Sprache:eng
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Zusammenfassung:The wrinkling behavior of thin films has received great attention for their applications in developing various wrinkle-based novel technologies. Herein, a new wrinkling system: tension-induced wrinkling in an elastomer-supported patched thin film (TW-P&SF) is investigated by using PDMS-supported patched polyimide thin films with different thicknesses and varied length/width ratios. Different from the well-studied compression-induced wrinkling in an elastomer-supported thin film (CW-SF) and tension-induced wrinkling in an edge-clamped free-standing thin film (TW-FF), in the system of TW-P&SF, the wrinkles are localized near the edge of the film with a finite length that follows a center-symmetric distribution. It was found that the wrinkle length l max and the wrinkle period λ scale with the film thickness h as λ ∼ h 0.86 and l max ∼ h –0.79. With the assistance of the two-dimensional shear lag model and scaling analysis, the underlying mechanism for wrinkle localization is clarified. Furthermore, the promise of the TW-P&SF-enabled wrinkle-based method as a new method for thin film mechanical characterization is demonstrated.
ISSN:0743-7463
1520-5827
DOI:10.1021/acs.langmuir.3c02282