Power results at 4 GHz of AlGaN/GaN HEMTs on high resistive silicon 111 substrate
The high potential at microwave frequencies of AlGaN/GaN high electron mobility transistors (HEMTs) on high resistive silicon [111] substrate for power applications has been demonstrated in this letter. For the first time, an output power density close to 1.8 W/mm and an associated power added effic...
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Veröffentlicht in: | IEEE microwave and wireless components letters 2003-03, Vol.13 (3), p.99-101 |
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Hauptverfasser: | , , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | The high potential at microwave frequencies of AlGaN/GaN high electron mobility transistors (HEMTs) on high resistive silicon [111] substrate for power applications has been demonstrated in this letter. For the first time, an output power density close to 1.8 W/mm and an associated power added efficiency of 32% have been measured on a 2 x 50 x 0.5 mum(2) HEMT with a linear power gain of 16 dB. These results constitute the state of the art. |
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ISSN: | 1531-1309 |
DOI: | 10.1109/LMWC.2003.810117 |