A double-recessed Al(0.24)GaAs/In(0.16)GaAspseudomorphic HEMT for < e1 > Ka < /e1 > -and Q -band power applications
A double-recessed 0.2-mum-gate-length pseudomorphic HEMT (PHEMT) has been demonstrated with 500 mW of output power (833 mW/mm of gate periphery), 6-dB gain, and 35% power-added efficiency (PAE) at 32 GHz. At 44 GHz, the device exhibited 494 mW of output power (823 mW/mm), 4.3-dB gain, and 30% PAE. T...
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Veröffentlicht in: | IEEE electron device letters 1993-09, Vol.14 (9), p.456-458 |
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Hauptverfasser: | , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | A double-recessed 0.2-mum-gate-length pseudomorphic HEMT (PHEMT) has been demonstrated with 500 mW of output power (833 mW/mm of gate periphery), 6-dB gain, and 35% power-added efficiency (PAE) at 32 GHz. At 44 GHz, the device exhibited 494 mW of output power (823 mW/mm), 4.3-dB gain, and 30% PAE. This level of performance is attributed to excellent MBE material, optimized epitaxial layer design, and the use of individual source vias and of double recess with tight channel dimensions. Excellent 3-in-wafer uniformity was also observed: DC yield was greater than 95% and the interquartile range for all DC parameters was less than 20% of the median value (most are significantly lower) |
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ISSN: | 0741-3106 |
DOI: | 10.1109/55.244708 |