The fabrication of submicron hexagonal arrays using multiple-exposure optical interferometry

The fabrication of submicron hexagonal arrays using multiple-exposure optical interferometry

We report on the use of multiple-exposure optical interferometry combined with nonlinear development of photoresist to enable the fabrication of hexagonal arrays of dots. The capability of the technique is demonstrated by the fabrication of a hexagonal array of 50-nm-radius dots having a 300-nm peri...

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Veröffentlicht in:IEEE photonics technology letters 1996-12, Vol.8 (12), p.1662-1664
Hauptverfasser: Kitson, S.C., Barnes, W.L., Sambles, J.R.
Format: Artikel
Sprache:eng
Schlagworte:
Interference
Interferometers
Optical arrays
Optical device fabrication
Optical interferometry
Optical surface waves
Photonic band gap
Resists
Substrates
Surface topography
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Zusammenfassung:We report on the use of multiple-exposure optical interferometry combined with nonlinear development of photoresist to enable the fabrication of hexagonal arrays of dots. The capability of the technique is demonstrated by the fabrication of a hexagonal array of 50-nm-radius dots having a 300-nm periodicity.
ISSN:1041-1135
1941-0174
DOI:10.1109/68.544711