Grinding of silicon carbide for optical surface fabrication. Part II. Subsurface damage
This paper is the second part of a study of the grinding of three different grades of silicon carbide (SiC) under the same conditions. In this paper, subsurface damage is analyzed using magnetorheological finishing (MRF). The MRF ribbon is brought into contact with the surface and allowed to dwell f...
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Veröffentlicht in: | Applied optics (2004) 2023-05, Vol.62 (14), p.3788-3796 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | This paper is the second part of a study of the grinding of three
different grades of silicon carbide (SiC) under the same conditions.
In this paper, subsurface damage is analyzed using magnetorheological
finishing (MRF). The MRF ribbon is brought into contact with the
surface and allowed to dwell for different lengths of time to produce
dimples or spots at different depths. The roughness parameters are
evaluated at the base of the spots. As the spot depth increases the
roughness parameters decrease, eventually saturating at a steady-state
value. The depth at which saturation occurs is much greater than the
initial peak-to-value roughness of the surface and is therefore
assumed to be correlated to the depth of subsurface damage in the
material. Estimates of the damage depth are comparable to other
estimates given in the literature. The validity of this technique is
assessed across different grades of SiC under different grinding
conditions, and limitations are identified. The study shows that the
microstructure of the SiC grade is a major factor that affects the
validity of the technique. The technique is suitable for SiC grades
that have a more homogeneous microstructure such as chemical vapor
deposited or chemical vapor composite grades. The presence of porosity
as in the direct sintered grade, or the presence of a secondary phase,
for example, silicon in the reaction-bonded and silicon-infiltrated
grades, could hinder the technique from providing
conclusive results. |
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ISSN: | 1559-128X 2155-3165 1539-4522 |
DOI: | 10.1364/AO.485978 |