Total dose radiation hard 0.35 mum SOI CMOS technology
This paper presents the total dose radiation performance of 0.35 mum SOI CMOS devices fabricated in a radiation hard full dose SIMO Xtechnology. The radiation performance is characterized by transistor threshold voltage shifts, transistor array leakage currents, and 256 K SRAM standby currents as a...
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Veröffentlicht in: | IEEE transactions on nuclear science 1998-12, Vol.45 (6), p.2442-2449 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | This paper presents the total dose radiation performance of 0.35 mum SOI CMOS devices fabricated in a radiation hard full dose SIMO Xtechnology. The radiation performance is characterized by transistor threshold voltage shifts, transistor array leakage currents, and 256 K SRAM standby currents as a function of total dose up to 10 Mrad(SiO(2)). The worst case threshold voltage shifts of front channels are less than 60 mV for PMOS transistors at 1 Mrad(SiO(2 )) and less than 10 mV for NMOS transistors. No significant radiation induced leakage currents are observed in small transistor arrays to 10 Mrad(SiO(2)). Standby currents of 256 K SRAMs are less than the 1.5 mA specification over the total dose range of 1 Mrad(SiO(2)). The results suggest high density SRAMs and ASIC fabricated in this technology will perform well in harsh radiation environment |
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ISSN: | 0018-9499 |
DOI: | 10.1109/23.736484 |