Early history of vacuum arc deposition

Early history of vacuum arc deposition

Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings,...

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Veröffentlicht in:IEEE transactions on plasma science 2001-10, Vol.29 (5), p.759-761
1. Verfasser: Boxman, R.L.
Format: Artikel
Sprache:eng
Schlagworte:
Arc deposition
Cathodes
Cathodic coating (process)
Coatings
Edison, Thomas Alva (1847-1931)
Electricity
Electrodes
Electron tubes
Experiments
Glass
Helium
History
Molds
Multilayers
Plasma
Replication
Scientists
Seeds
Shielding
Switches
Transistors
Vacuum arcs
Wright, Arthur W
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Beschreibung
Zusammenfassung:Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings, substrate motion, and hybrid processing.
ISSN:0093-3813
1939-9375
DOI:10.1109/27.964470