Preparation and characterization of metallorganic chemical vapour deposited molybdenum (II) oxide (MoO) thin films

Thin films of molybdenum monoxide were deposited by metallorganic chemical vapour deposition and characterized using Rutherdford backscattering spectroscopy, Fourier Transformed Infrared and UV–Visible spectroscopies, X-ray diffraction, van der Pauw conductivity measurement and impedance spectroscop...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Thin solid films 2005-01, Vol.472 (1), p.84-89
Hauptverfasser: Ilori, O.O., Osasona, O., Eleruja, M.A., Egharevba, G.O., Adegboyega, G.A., Chiodelli, G., Boudreault, G., Jeynes, C., Ajayi, E.O.B.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Thin films of molybdenum monoxide were deposited by metallorganic chemical vapour deposition and characterized using Rutherdford backscattering spectroscopy, Fourier Transformed Infrared and UV–Visible spectroscopies, X-ray diffraction, van der Pauw conductivity measurement and impedance spectroscopy measurement. MoO 2(C 5H 7O 2) 2 was used as a precursor. Results show that the film is crystalline and semiconducting. Optical characterization gave an energy gap of 3.02 eV. DC conductivity measurements show the conductivity mechanism to be that of small polaron hopping with an activation energy of 0.992 eV and also the existence of a sharp transition in conductivity at about 450 °C. Impedance data show that the film has two conductivity phases.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2004.06.135