Recording heads with track widths suitable for 100 Gbit/in(2 ) density

Focused ion beam etching has been used to trim both longitudinal and perpendicular recording heads with track widths as narrow as 60 nm. 3D boundary element modeling has been used to optimize trimming parameters. Tracks written with the trimmed heads using spin-stands and imaged using magnetic force...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on magnetics 1999-09, Vol.35 (5), p.2544-2546
Hauptverfasser: Khizroev, S K, Kryder, M H, Ikeda, Y, Rubin, K, Arnett, P, Best, M, Thompson, D A
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Focused ion beam etching has been used to trim both longitudinal and perpendicular recording heads with track widths as narrow as 60 nm. 3D boundary element modeling has been used to optimize trimming parameters. Tracks written with the trimmed heads using spin-stands and imaged using magnetic force microscopy were as narrow as 100 nm
ISSN:0018-9464
DOI:10.1109/20.800885