Vertical and Smooth Microfabrication of InP Using Simple High-Density Plasma System with SmCo Ring Magnet

We demonstrated the formation of high-density plasma using a SmCo ring magnet and its application to the vertical and smooth etching of InP. It is found that the high-density plasma using the magnet is well confined inside the magnetic fields. The ion density of the plasma using the magnet is much h...

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Veröffentlicht in:Japanese Journal of Applied Physics 2004-07, Vol.43 (7B), p.L960-L962
Hauptverfasser: Matsutani, Akihiro, Ohtsuki, Hideo, Ohashi, Ken, Yokoyama, Tomonori, Yamakage, Hirokazu, Koyama, Fumio
Format: Artikel
Sprache:eng
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Zusammenfassung:We demonstrated the formation of high-density plasma using a SmCo ring magnet and its application to the vertical and smooth etching of InP. It is found that the high-density plasma using the magnet is well confined inside the magnetic fields. The ion density of the plasma using the magnet is much higher than that of the plasma without the magnet at the same input RF power. The etching profile and the roughness of the etched bottom surface are improved using the high-density plasma. The proposed dry etching technique using the high-density plasma formed with a magnet will become an effective technique for the microfabrication of semiconductors or other materials.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.43.L960