The Effect of Various Parameters on the Structure of W-Ti Thin Films

The properties of W-Ti thin films/coatings deposited by sputtering on various substrates have been studied. Structural analyses were made by X-ray diffraction and scanning tunneling microscopy. The results have shown that the crystal structure of W-Ti coatings has the same structure as tungsten; the...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Materials science forum 2004-01, Vol.453-454, p.55-60
Hauptverfasser: Petrovic, S, Gakovic, B, Rakocevic, Z, Nenadovic, T
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The properties of W-Ti thin films/coatings deposited by sputtering on various substrates have been studied. Structural analyses were made by X-ray diffraction and scanning tunneling microscopy. The results have shown that the crystal structure of W-Ti coatings has the same structure as tungsten; the presence of titanium gave rise to the expansion of the *a - tungsten lattice. Microstructural features - grain size and morphology - mean surface roughness depend on substrate properties and thickness of the coatings. For the same thickness of deposited coatings, different microstructure features have been obtained as a function of substrate structure. The mean surface roughness and the grain size increase with increasing thickness of deposits on the same substrate. (Substrate materials: silicon, aluminum, steel.)
ISSN:0255-5476
1662-9752
1662-9752
DOI:10.4028/www.scientific.net/MSF.453-454.55