The Effect of Various Parameters on the Structure of W-Ti Thin Films
The properties of W-Ti thin films/coatings deposited by sputtering on various substrates have been studied. Structural analyses were made by X-ray diffraction and scanning tunneling microscopy. The results have shown that the crystal structure of W-Ti coatings has the same structure as tungsten; the...
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Veröffentlicht in: | Materials science forum 2004-01, Vol.453-454, p.55-60 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The properties of W-Ti thin films/coatings deposited by sputtering on various substrates have been studied. Structural analyses were made by X-ray diffraction and scanning tunneling microscopy. The results have shown that the crystal structure of W-Ti coatings has the same structure as tungsten; the presence of titanium gave rise to the expansion of the *a - tungsten lattice. Microstructural features - grain size and morphology - mean surface roughness depend on substrate properties and thickness of the coatings. For the same thickness of deposited coatings, different microstructure features have been obtained as a function of substrate structure. The mean surface roughness and the grain size increase with increasing thickness of deposits on the same substrate. (Substrate materials: silicon, aluminum, steel.) |
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ISSN: | 0255-5476 1662-9752 1662-9752 |
DOI: | 10.4028/www.scientific.net/MSF.453-454.55 |