Ion implanted integrated optics (I3O) technology for planar lightwave circuits fabrication

The Ion Implanted Integrated Optics (I3O) technology, using titanium ion implantation in bulk silica to fabricate passive compact planar lightwave circuits (PLCs), is presented in this paper. Its advantages are described and compared with other waveguide fabrication technologies. It is demonstrated...

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Veröffentlicht in:	Journal of lightwave technology 2004-10, Vol.22 (10), p.2310-2315
Hauptverfasser:	Drouard, E., Escoubas, L., Flory, F., Tisserand, S., Roux, L.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Circuit properties Circuits Electric, optical and optoelectronic circuits Electromagnetic fields Electromagnetic waveguides Electronics Exact sciences and technology Integrated circuit technology Integrated optics Integrated optics. Optical fibers and wave guides Ion implantation Microelectronic fabrication (materials and surfaces technology) Optical and optoelectronic circuits Optical device fabrication Optical waveguides Programmable control Radius of curvature Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Silicon compounds Silicon dioxide Titanium Waveguides
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Beschreibung
Zusammenfassung:	The Ion Implanted Integrated Optics (I3O) technology, using titanium ion implantation in bulk silica to fabricate passive compact planar lightwave circuits (PLCs), is presented in this paper. Its advantages are described and compared with other waveguide fabrication technologies. It is demonstrated that the guided electromagnetic field can be tailored by adjusting the titanium ion dose either to fit the guided mode of standard single-mode fibers or to allow a sharp radius of curvature of bent waveguides.
ISSN:	0733-8724 1558-2213
DOI:	10.1109/JLT.2004.833285