Negative ion production rates in rare gas-halide lasers

This paper reports on dissociative electron attachment in F 2 , NF 3 , Cl 2 , and I 2 . The principle of the method is to produce a short burst of photoelectrons from a photocathode by means of light from an argon-fluoride laser. Subsequently, by studying the motion of electrons and negative ions in...

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Veröffentlicht in:IEEE journal of quantum electronics 1979-11, Vol.15 (11), p.1216-1223
Hauptverfasser: Nygaard, K., Brooks, H., Hunter, S.
Format: Artikel
Sprache:eng
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Zusammenfassung:This paper reports on dissociative electron attachment in F 2 , NF 3 , Cl 2 , and I 2 . The principle of the method is to produce a short burst of photoelectrons from a photocathode by means of light from an argon-fluoride laser. Subsequently, by studying the motion of electrons and negative ions in a constant electric field ( E ) region, information is obtained about drift velocities and effective attachment cross sections. Helium, argon, and nitrogen were used as buffer gases. Of particular interest is a very strong temperature dependence of the attachment coefficient in I 2 . Measurements were taken from 35 to 110°C, covering an E/N range of 1-50 Townsend. An explanation based on vibrational excitation is presented.
ISSN:0018-9197
1558-1713
DOI:10.1109/JQE.1979.1069918