Negative ion production rates in rare gas-halide lasers
This paper reports on dissociative electron attachment in F 2 , NF 3 , Cl 2 , and I 2 . The principle of the method is to produce a short burst of photoelectrons from a photocathode by means of light from an argon-fluoride laser. Subsequently, by studying the motion of electrons and negative ions in...
Gespeichert in:
Veröffentlicht in: | IEEE journal of quantum electronics 1979-11, Vol.15 (11), p.1216-1223 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | This paper reports on dissociative electron attachment in F 2 , NF 3 , Cl 2 , and I 2 . The principle of the method is to produce a short burst of photoelectrons from a photocathode by means of light from an argon-fluoride laser. Subsequently, by studying the motion of electrons and negative ions in a constant electric field ( E ) region, information is obtained about drift velocities and effective attachment cross sections. Helium, argon, and nitrogen were used as buffer gases. Of particular interest is a very strong temperature dependence of the attachment coefficient in I 2 . Measurements were taken from 35 to 110°C, covering an E/N range of 1-50 Townsend. An explanation based on vibrational excitation is presented. |
---|---|
ISSN: | 0018-9197 1558-1713 |
DOI: | 10.1109/JQE.1979.1069918 |