Millimeter-wave low-noise and high-power metamorphic HEMT amplifiers and devices on GaAs substrates

This paper reports on state of-the-art HEMT devices and circuit results utilizing 32% and 60% indium content InGaAs channel metamorphic technology on GaAs substrates. The 60% In metamorphic HEMT (MHEMT) has achieved an excellent 0.61-dB minimum noise figure with 11.8 dB of associated gain at 26 GHz....

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Veröffentlicht in:IEEE journal of solid-state circuits 2000-09, Vol.35 (9), p.1307-1311
Hauptverfasser: Whelan, C.S., Kazior, T.E., Marsh, P.F., Hoke, W.E., McTaggart, R.A., Lyman, P.S., Lemonias, P.J., Lardizabal, S.M., Leoni, R.E., Lichwala, S.J.
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container_end_page 1311
container_issue 9
container_start_page 1307
container_title IEEE journal of solid-state circuits
container_volume 35
creator Whelan, C.S.
Kazior, T.E.
Marsh, P.F.
Hoke, W.E.
McTaggart, R.A.
Lyman, P.S.
Lemonias, P.J.
Lardizabal, S.M.
Leoni, R.E.
Lichwala, S.J.
description This paper reports on state of-the-art HEMT devices and circuit results utilizing 32% and 60% indium content InGaAs channel metamorphic technology on GaAs substrates. The 60% In metamorphic HEMT (MHEMT) has achieved an excellent 0.61-dB minimum noise figure with 11.8 dB of associated gain at 26 GHz. Using this MHEMT technology, two and three-stage Ka-band low-noise amplifiers (LNAs) have demonstrated
doi_str_mv 10.1109/4.868040
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source IEEE Electronic Library (IEL)
subjects Circuits
Gain
Gallium arsenide
HEMTs
High power amplifiers
Indium gallium arsenide
Low-noise amplifiers
mHEMTs
Millimeter wave technology
Noise figure
title Millimeter-wave low-noise and high-power metamorphic HEMT amplifiers and devices on GaAs substrates
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