Optical Properties of High Energy Tin (Sn 5+ ) Ion Irradiated Metal-Organic Chemical Vapor Deposition Grown GaN on Sapphire
Unintentionally doped n-type GaN(0001) epitaxial layers grown by metal-organic chemical vapor deposition (MOCVD) on sapphire substrates have been irradiated with 75 MeV Tin (Sn 5+ ) ion. Effect of different ion fluences at 10 11 , 10 12 and 10 13 cm -2 were studied by means of time correlated single...
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Veröffentlicht in: | Japanese Journal of Applied Physics 2004-07, Vol.43 (7R), p.4150-4152 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Unintentionally doped n-type GaN(0001) epitaxial layers grown by metal-organic chemical vapor deposition (MOCVD) on sapphire substrates have been irradiated with 75 MeV Tin (Sn
5+
) ion. Effect of different ion fluences at 10
11
, 10
12
and 10
13
cm
-2
were studied by means of time correlated single photon counting (TCSPC), UV-visible optical spectroscopy and photoluminescence (PL) measurements at room temperature. The exponential decay of minority carrier life times was observed between 1910 and 1110 ps (pico-second) with increasing ion doses upto 10
13
cm
-2
. High-energy irradiation with different ion fluences of GaN epitaxial layers creates midgap states in the material. Change in the absorption edges between 3.41 and 2.95 eV were observed by UV-absorption coefficient (α
2
) method on increasing fluences rate. Band-edge and yellow emissions were recorded for all GaN samples by transient steady state PL measurement at room temperature. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.43.4150 |