High-speed photoluminescence mapping of III-V epitaxial layers for light-emitting diodes
Three examples are presented which demonstrate how photoluminescence wafer mapping is routinely used in the development and manufacturing of III-V optoelectronic materials and devices. Statistical data from the full-wafer PL scans of epitaxial layers is correlated with the device performance of fabr...
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Veröffentlicht in: | IEEE journal of selected topics in quantum electronics 1995-12, Vol.1 (4), p.987-992 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Three examples are presented which demonstrate how photoluminescence wafer mapping is routinely used in the development and manufacturing of III-V optoelectronic materials and devices. Statistical data from the full-wafer PL scans of epitaxial layers is correlated with the device performance of fabricated light-emitting diodes, and can be used to predict the brightness, uniformity and yield of these devices. |
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ISSN: | 1077-260X 1558-4542 |
DOI: | 10.1109/2944.488396 |