Dielectrophoresis-assisted removal of Cd and Cu heavy metal ions by using Chlorella microalgae

A novel dielectrophoresis (DEP)-assisted device for the bioremediation of heavy metal ions by using Chlorella microalgae is presented in this paper. To generate the DEP forces, pairs of electrode mesh were inserted in the DEP-assisted device. By applying DC electric field via the electrodes, the inh...

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Veröffentlicht in:Environmental pollution (1987) 2023-10, Vol.334, p.122110-122110, Article 122110
Hauptverfasser: Zhao, Kai, Zhao, Xun, Gao, Tianbo, Li, Xuan, Wang, Guanqi, Pan, Xinxiang, Wang, Junsheng
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Sprache:eng
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Zusammenfassung:A novel dielectrophoresis (DEP)-assisted device for the bioremediation of heavy metal ions by using Chlorella microalgae is presented in this paper. To generate the DEP forces, pairs of electrode mesh were inserted in the DEP-assisted device. By applying DC electric field via the electrodes, the inhomogeneous electric field gradient is induced and the strongest non-uniform electric field exists near the mesh cross-corner. After the adsorption of Cd and Cu heavy metal ions by Chlorella, the Chlorella chain were trapped along the vicinity of the electrode mesh. Then, the effects of Chlorella concentration on the adsorption of heavy metal ions, and the applied voltage and electrode mesh size on the removal of Chlorella are conducted. In the co-existing Cd and Cu solutions, the individual adsorption ratio of Cd and Cu reaches as high as approximately 96% and 98%, respectively, showing excellent bioremediation capability of multiple heavy metal ions in wastewater. By adjusting the applied electric voltage and the mesh size, the Chlorella adsorbed with Cd and Cu are captured by negative DC-DEP effects and the removal ratio of Chlorella reach an average of 97%, providing a method for the removal of multiple heavy metal ions in wastewater by using Chlorella microalgae. [Display omitted] •Chlorella algae serves as a bioremediation alternative for wastewater purification.•The maximum adsorption rate of Cd and Cu by Chlorella reaches as high as 99%.•DEP-assist device is developed for removal of Chlorella adsorbed with heavy metal.•The Chlorella are subjected to negative dielectrophoretic force.•The average removal rate of Chlorella is approximately 97% in DEP-assist device.
ISSN:0269-7491
1873-6424
DOI:10.1016/j.envpol.2023.122110