Effects of defect propagation/growth on in-line defect-based yield prediction

This paper presents the importance of understanding defect propagation/growth and its impact on in-line yield prediction. In order to improve the prediction accuracy, impact of defect propagation and growth phenomena needs to be modeled and incorporated into yield prediction system. We developed a n...

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Veröffentlicht in:IEEE transactions on semiconductor manufacturing 1998-11, Vol.11 (4), p.546-551
Hauptverfasser: Shindo, W., Nurani, R.K., Strojwas, A.J.
Format: Artikel
Sprache:eng
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Zusammenfassung:This paper presents the importance of understanding defect propagation/growth and its impact on in-line yield prediction. In order to improve the prediction accuracy, impact of defect propagation and growth phenomena needs to be modeled and incorporated into yield prediction system. We developed a new yield prediction model by taking into account defect carryover. The empirical results of interlayer and intralayer defect propagation analysis using actual fabline data are presented.
ISSN:0894-6507
1558-2345
DOI:10.1109/66.728550