Analyses of thin films and surfaces by cold neutron depth profiling
Neutron depth profiling (NDP) has been employed to examine manufacturing processes and starting materials for several high-technology applications. NDP combines nuclear and atomic physics processes to determine the concentration profile of several light elements in the near surface region (∼1–8μm) o...
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Veröffentlicht in: | Applied surface science 2004-11, Vol.238 (1-4), p.108-112 |
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description | Neutron depth profiling (NDP) has been employed to examine manufacturing processes and starting materials for several high-technology applications. NDP combines nuclear and atomic physics processes to determine the concentration profile of several light elements in the near surface region (∼1–8μm) of smooth surfaces. The method is both quantitative and non-destructive. Analyses are performed at the Center for Neutron Research at NIST on samples prepared at Corning Incorporated. Two types of samples have been analyzed: (1) Boron profiles are measured in glasses to determine B loss due to its volatilization during manufacturing. Surface depletion of B is a key characteristic of borosilicate materials for both chemical vapor deposition and conventional melting processes. (2) For lithium niobate, a quantitative measure of Li concentration can differentiate congruent and stoichiometric compositions and any surface depletion in commercial wafers. |
doi_str_mv | 10.1016/j.apsusc.2004.05.192 |
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fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_28274577</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0169433204008335</els_id><sourcerecordid>28110906</sourcerecordid><originalsourceid>FETCH-LOGICAL-c396t-2c0933ab75e15c9e1fc57252127b8ea6ab63ef975ac293a4d6da3c06db0c1cf53</originalsourceid><addsrcrecordid>eNqNkE1r3DAQhkVoods0_6AHXZKbHX1Y9upSCEvSBgK5JGchj0eJFq-81diB_ffVsoHeQk5zeJ-Zd3gY-ylFLYVsr7e139NCUCshmlqYWlp1xlZy3enKmHXzha0KZqtGa_WNfSfaCiFVSVdsc5P8eCAkPgU-v8bEQxx3xH0aOC05eChRf-AwjQNPuMx5SnzA_fzK93kqbEwvP9jX4EfCi_d5zp7vbp82f6qHx9_3m5uHCrRt50qBsFr7vjMoDViUAUynjJKq69foW9-3GoPtjAdltW-GdvAaRDv0AiQEo8_Z1eluaf67IM1uFwlwHH3CaSGn1qprTNd9ApRSWNEWsDmBkCeijMHtc9z5fHBSuKNat3Unte6o1gnjitqydvl-3xP4MWSfINL_3bZprLLHh3-dOCxW3iJmRxAxAQ4xI8xumOLHRf8A-qWRLg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>28110906</pqid></control><display><type>article</type><title>Analyses of thin films and surfaces by cold neutron depth profiling</title><source>Elsevier ScienceDirect Journals Complete</source><creator>Lamaze, G.P. ; Chen-Mayer, H.H. ; Soni, K.K.</creator><creatorcontrib>Lamaze, G.P. ; Chen-Mayer, H.H. ; Soni, K.K.</creatorcontrib><description>Neutron depth profiling (NDP) has been employed to examine manufacturing processes and starting materials for several high-technology applications. NDP combines nuclear and atomic physics processes to determine the concentration profile of several light elements in the near surface region (∼1–8μm) of smooth surfaces. The method is both quantitative and non-destructive. Analyses are performed at the Center for Neutron Research at NIST on samples prepared at Corning Incorporated. Two types of samples have been analyzed: (1) Boron profiles are measured in glasses to determine B loss due to its volatilization during manufacturing. Surface depletion of B is a key characteristic of borosilicate materials for both chemical vapor deposition and conventional melting processes. (2) For lithium niobate, a quantitative measure of Li concentration can differentiate congruent and stoichiometric compositions and any surface depletion in commercial wafers.</description><identifier>ISSN: 0169-4332</identifier><identifier>EISSN: 1873-5584</identifier><identifier>DOI: 10.1016/j.apsusc.2004.05.192</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Boron ; Borosilicate glass ; Chemical composition analysis, chemical depth and dopant profiling ; Cross-disciplinary physics: materials science; rheology ; Depth profiling ; Exact sciences and technology ; Lithium niobate ; Materials science ; Materials testing ; Neutrons ; Physics</subject><ispartof>Applied surface science, 2004-11, Vol.238 (1-4), p.108-112</ispartof><rights>2004 Elsevier B.V.</rights><rights>2005 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c396t-2c0933ab75e15c9e1fc57252127b8ea6ab63ef975ac293a4d6da3c06db0c1cf53</citedby><cites>FETCH-LOGICAL-c396t-2c0933ab75e15c9e1fc57252127b8ea6ab63ef975ac293a4d6da3c06db0c1cf53</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.apsusc.2004.05.192$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,780,784,789,790,3541,23921,23922,25131,27915,27916,45986</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=16449295$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Lamaze, G.P.</creatorcontrib><creatorcontrib>Chen-Mayer, H.H.</creatorcontrib><creatorcontrib>Soni, K.K.</creatorcontrib><title>Analyses of thin films and surfaces by cold neutron depth profiling</title><title>Applied surface science</title><description>Neutron depth profiling (NDP) has been employed to examine manufacturing processes and starting materials for several high-technology applications. NDP combines nuclear and atomic physics processes to determine the concentration profile of several light elements in the near surface region (∼1–8μm) of smooth surfaces. The method is both quantitative and non-destructive. Analyses are performed at the Center for Neutron Research at NIST on samples prepared at Corning Incorporated. Two types of samples have been analyzed: (1) Boron profiles are measured in glasses to determine B loss due to its volatilization during manufacturing. Surface depletion of B is a key characteristic of borosilicate materials for both chemical vapor deposition and conventional melting processes. (2) For lithium niobate, a quantitative measure of Li concentration can differentiate congruent and stoichiometric compositions and any surface depletion in commercial wafers.</description><subject>Boron</subject><subject>Borosilicate glass</subject><subject>Chemical composition analysis, chemical depth and dopant profiling</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Depth profiling</subject><subject>Exact sciences and technology</subject><subject>Lithium niobate</subject><subject>Materials science</subject><subject>Materials testing</subject><subject>Neutrons</subject><subject>Physics</subject><issn>0169-4332</issn><issn>1873-5584</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2004</creationdate><recordtype>article</recordtype><recordid>eNqNkE1r3DAQhkVoods0_6AHXZKbHX1Y9upSCEvSBgK5JGchj0eJFq-81diB_ffVsoHeQk5zeJ-Zd3gY-ylFLYVsr7e139NCUCshmlqYWlp1xlZy3enKmHXzha0KZqtGa_WNfSfaCiFVSVdsc5P8eCAkPgU-v8bEQxx3xH0aOC05eChRf-AwjQNPuMx5SnzA_fzK93kqbEwvP9jX4EfCi_d5zp7vbp82f6qHx9_3m5uHCrRt50qBsFr7vjMoDViUAUynjJKq69foW9-3GoPtjAdltW-GdvAaRDv0AiQEo8_Z1eluaf67IM1uFwlwHH3CaSGn1qprTNd9ApRSWNEWsDmBkCeijMHtc9z5fHBSuKNat3Unte6o1gnjitqydvl-3xP4MWSfINL_3bZprLLHh3-dOCxW3iJmRxAxAQ4xI8xumOLHRf8A-qWRLg</recordid><startdate>20041115</startdate><enddate>20041115</enddate><creator>Lamaze, G.P.</creator><creator>Chen-Mayer, H.H.</creator><creator>Soni, K.K.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><scope>7QQ</scope><scope>7SR</scope><scope>7U5</scope><scope>JG9</scope></search><sort><creationdate>20041115</creationdate><title>Analyses of thin films and surfaces by cold neutron depth profiling</title><author>Lamaze, G.P. ; Chen-Mayer, H.H. ; Soni, K.K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c396t-2c0933ab75e15c9e1fc57252127b8ea6ab63ef975ac293a4d6da3c06db0c1cf53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2004</creationdate><topic>Boron</topic><topic>Borosilicate glass</topic><topic>Chemical composition analysis, chemical depth and dopant profiling</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Depth profiling</topic><topic>Exact sciences and technology</topic><topic>Lithium niobate</topic><topic>Materials science</topic><topic>Materials testing</topic><topic>Neutrons</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lamaze, G.P.</creatorcontrib><creatorcontrib>Chen-Mayer, H.H.</creatorcontrib><creatorcontrib>Soni, K.K.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Ceramic Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Materials Research Database</collection><jtitle>Applied surface science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lamaze, G.P.</au><au>Chen-Mayer, H.H.</au><au>Soni, K.K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Analyses of thin films and surfaces by cold neutron depth profiling</atitle><jtitle>Applied surface science</jtitle><date>2004-11-15</date><risdate>2004</risdate><volume>238</volume><issue>1-4</issue><spage>108</spage><epage>112</epage><pages>108-112</pages><issn>0169-4332</issn><eissn>1873-5584</eissn><abstract>Neutron depth profiling (NDP) has been employed to examine manufacturing processes and starting materials for several high-technology applications. NDP combines nuclear and atomic physics processes to determine the concentration profile of several light elements in the near surface region (∼1–8μm) of smooth surfaces. The method is both quantitative and non-destructive. Analyses are performed at the Center for Neutron Research at NIST on samples prepared at Corning Incorporated. Two types of samples have been analyzed: (1) Boron profiles are measured in glasses to determine B loss due to its volatilization during manufacturing. Surface depletion of B is a key characteristic of borosilicate materials for both chemical vapor deposition and conventional melting processes. (2) For lithium niobate, a quantitative measure of Li concentration can differentiate congruent and stoichiometric compositions and any surface depletion in commercial wafers.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.apsusc.2004.05.192</doi><tpages>5</tpages></addata></record> |
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subjects | Boron Borosilicate glass Chemical composition analysis, chemical depth and dopant profiling Cross-disciplinary physics: materials science rheology Depth profiling Exact sciences and technology Lithium niobate Materials science Materials testing Neutrons Physics |
title | Analyses of thin films and surfaces by cold neutron depth profiling |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-14T19%3A12%3A08IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Analyses%20of%20thin%20films%20and%20surfaces%20by%20cold%20neutron%20depth%20profiling&rft.jtitle=Applied%20surface%20science&rft.au=Lamaze,%20G.P.&rft.date=2004-11-15&rft.volume=238&rft.issue=1-4&rft.spage=108&rft.epage=112&rft.pages=108-112&rft.issn=0169-4332&rft.eissn=1873-5584&rft_id=info:doi/10.1016/j.apsusc.2004.05.192&rft_dat=%3Cproquest_cross%3E28110906%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=28110906&rft_id=info:pmid/&rft_els_id=S0169433204008335&rfr_iscdi=true |