Analyses of thin films and surfaces by cold neutron depth profiling

Neutron depth profiling (NDP) has been employed to examine manufacturing processes and starting materials for several high-technology applications. NDP combines nuclear and atomic physics processes to determine the concentration profile of several light elements in the near surface region (∼1–8μm) o...

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Veröffentlicht in:Applied surface science 2004-11, Vol.238 (1-4), p.108-112
Hauptverfasser: Lamaze, G.P., Chen-Mayer, H.H., Soni, K.K.
Format: Artikel
Sprache:eng
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Zusammenfassung:Neutron depth profiling (NDP) has been employed to examine manufacturing processes and starting materials for several high-technology applications. NDP combines nuclear and atomic physics processes to determine the concentration profile of several light elements in the near surface region (∼1–8μm) of smooth surfaces. The method is both quantitative and non-destructive. Analyses are performed at the Center for Neutron Research at NIST on samples prepared at Corning Incorporated. Two types of samples have been analyzed: (1) Boron profiles are measured in glasses to determine B loss due to its volatilization during manufacturing. Surface depletion of B is a key characteristic of borosilicate materials for both chemical vapor deposition and conventional melting processes. (2) For lithium niobate, a quantitative measure of Li concentration can differentiate congruent and stoichiometric compositions and any surface depletion in commercial wafers.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2004.05.192