Domain structures supported by micron-sized patterned Co/Cu multilayers with AF and FM coupling

Micron-sized Co/Cu multilayer elements were prepared by dc magnetron sputtering and subsequent lift-off patterning. Two types of patterned multilayers, AF or PM coupled, were produced by controlling the width of the Cu spacer layers. Domain structures supported by these elements during magnetic switching have been imaged directly using the Lorentz imaging mode, differential phase contrast, in TEM. Patterning of the FM coupled multilayers introduces significant differences in the domain structures observed in the films as they adopt flux closure geometries in the remanent state. For AF-coupled multilayers little change occurs.