Ultra-shallow junctions produced by plasma doping and flash lamp annealing
The capabilities of plasma doping (PLAD) and flash lamp annealing (FLA) for use in ultra-shallow junction (USJ) fabrication have been evaluated. Silicon wafers have been doped in a BF 3 plasma using wafer biases ranging from 0.6 to 1 kV and a dose of 4 × 10 15 cm −2. The wafers so implanted have bee...
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| Veröffentlicht in: | Materials science & engineering. B, Solid-state materials for advanced technology Solid-state materials for advanced technology, 2004-12, Vol.114, p.358-361 |
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| container_title | Materials science & engineering. B, Solid-state materials for advanced technology |
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| creator | Skorupa, Wolfgang Yankov, Rossen A. Anwand, Wolfgang Voelskow, Matthias Gebel, Thoralf Downey, Daniel F. Arevalo, Edwin A. |
| description | The capabilities of plasma doping (PLAD) and flash lamp annealing (FLA) for use in ultra-shallow junction (USJ) fabrication have been evaluated. Silicon wafers have been doped in a BF
3 plasma using wafer biases ranging from 0.6 to 1
kV and a dose of 4 × 10
15
cm
−2. The wafers so implanted have been heat-treated by FLA using pre-heating temperatures in the range of 500–700
°C, peak temperatures of 1100–1350
°C, and effective anneal times of 20 and 3
ms. Secondary ion mass spectrometry (SIMS) and sheet resistance measurements have been undertaken to determine the junction depth and the sheet resistance, respectively. Optimum processing conditions have been identified under which both high electrical activation and insignificant dopant diffusion occur compared to the as-implanted state. In this way, one can obtain combinations of junction depth and sheet resistance that meet the 45
nm technology node requirements. |
| doi_str_mv | 10.1016/j.mseb.2004.07.063 |
| format | Article |
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3 plasma using wafer biases ranging from 0.6 to 1
kV and a dose of 4 × 10
15
cm
−2. The wafers so implanted have been heat-treated by FLA using pre-heating temperatures in the range of 500–700
°C, peak temperatures of 1100–1350
°C, and effective anneal times of 20 and 3
ms. Secondary ion mass spectrometry (SIMS) and sheet resistance measurements have been undertaken to determine the junction depth and the sheet resistance, respectively. Optimum processing conditions have been identified under which both high electrical activation and insignificant dopant diffusion occur compared to the as-implanted state. In this way, one can obtain combinations of junction depth and sheet resistance that meet the 45
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3 plasma using wafer biases ranging from 0.6 to 1
kV and a dose of 4 × 10
15
cm
−2. The wafers so implanted have been heat-treated by FLA using pre-heating temperatures in the range of 500–700
°C, peak temperatures of 1100–1350
°C, and effective anneal times of 20 and 3
ms. Secondary ion mass spectrometry (SIMS) and sheet resistance measurements have been undertaken to determine the junction depth and the sheet resistance, respectively. Optimum processing conditions have been identified under which both high electrical activation and insignificant dopant diffusion occur compared to the as-implanted state. In this way, one can obtain combinations of junction depth and sheet resistance that meet the 45
nm technology node requirements.</description><subject>Flash lamp annealing</subject><subject>Plasma doping</subject><subject>Ultra-shallow junctions</subject><issn>0921-5107</issn><issn>1873-4944</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2004</creationdate><recordtype>article</recordtype><recordid>eNp9kLtOxDAQRS0EEsvCD1ClokuYcZw4kWjQiqdWomFry7Ed1ivngZ2A-HscLTXVPO9o7iHkGiFDwPL2kHXBNBkFYBnwDMr8hKyw4nnKasZOyQpqimmBwM_JRQgHAEBK6Yq87tzkZRr20rnhOznMvZrs0Idk9IOeldFJ85OMToZOJnoYbf-RyF4nbezsEye7MZa9kS4OLslZK10wV39xTXaPD--b53T79vSyud-mKq_5lLJStjnlTEPDa0qBI6NUFyXmaPiSNhUrdFsr1CVqjqppkRbKVKBRVtHSmtwc78YXP2cTJtHZoIxzsjfDHAStKKugquMiPS4qP4TgTStGbzvpfwSCWLCJg1iwiQWbAC4itii6O4pMtPBljRdBWdNHEtYbNQk92P_kv9yndeg</recordid><startdate>20041215</startdate><enddate>20041215</enddate><creator>Skorupa, Wolfgang</creator><creator>Yankov, Rossen A.</creator><creator>Anwand, Wolfgang</creator><creator>Voelskow, Matthias</creator><creator>Gebel, Thoralf</creator><creator>Downey, Daniel F.</creator><creator>Arevalo, Edwin A.</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20041215</creationdate><title>Ultra-shallow junctions produced by plasma doping and flash lamp annealing</title><author>Skorupa, Wolfgang ; Yankov, Rossen A. ; Anwand, Wolfgang ; Voelskow, Matthias ; Gebel, Thoralf ; Downey, Daniel F. ; Arevalo, Edwin A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c397t-46af3274d0b7922071422d56131e7422db845df9c1d61d71cbf125ce80d1a8873</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2004</creationdate><topic>Flash lamp annealing</topic><topic>Plasma doping</topic><topic>Ultra-shallow junctions</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Skorupa, Wolfgang</creatorcontrib><creatorcontrib>Yankov, Rossen A.</creatorcontrib><creatorcontrib>Anwand, Wolfgang</creatorcontrib><creatorcontrib>Voelskow, Matthias</creatorcontrib><creatorcontrib>Gebel, Thoralf</creatorcontrib><creatorcontrib>Downey, Daniel F.</creatorcontrib><creatorcontrib>Arevalo, Edwin A.</creatorcontrib><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Materials science & engineering. B, Solid-state materials for advanced technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Skorupa, Wolfgang</au><au>Yankov, Rossen A.</au><au>Anwand, Wolfgang</au><au>Voelskow, Matthias</au><au>Gebel, Thoralf</au><au>Downey, Daniel F.</au><au>Arevalo, Edwin A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Ultra-shallow junctions produced by plasma doping and flash lamp annealing</atitle><jtitle>Materials science & engineering. B, Solid-state materials for advanced technology</jtitle><date>2004-12-15</date><risdate>2004</risdate><volume>114</volume><spage>358</spage><epage>361</epage><pages>358-361</pages><issn>0921-5107</issn><eissn>1873-4944</eissn><abstract>The capabilities of plasma doping (PLAD) and flash lamp annealing (FLA) for use in ultra-shallow junction (USJ) fabrication have been evaluated. Silicon wafers have been doped in a BF
3 plasma using wafer biases ranging from 0.6 to 1
kV and a dose of 4 × 10
15
cm
−2. The wafers so implanted have been heat-treated by FLA using pre-heating temperatures in the range of 500–700
°C, peak temperatures of 1100–1350
°C, and effective anneal times of 20 and 3
ms. Secondary ion mass spectrometry (SIMS) and sheet resistance measurements have been undertaken to determine the junction depth and the sheet resistance, respectively. Optimum processing conditions have been identified under which both high electrical activation and insignificant dopant diffusion occur compared to the as-implanted state. In this way, one can obtain combinations of junction depth and sheet resistance that meet the 45
nm technology node requirements.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.mseb.2004.07.063</doi><tpages>4</tpages></addata></record> |
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| identifier | ISSN: 0921-5107 |
| ispartof | Materials science & engineering. B, Solid-state materials for advanced technology, 2004-12, Vol.114, p.358-361 |
| issn | 0921-5107 1873-4944 |
| language | eng |
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| source | Elsevier ScienceDirect Journals |
| subjects | Flash lamp annealing Plasma doping Ultra-shallow junctions |
| title | Ultra-shallow junctions produced by plasma doping and flash lamp annealing |
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