Microstructure and stability of sputtered titanium aluminides on SiO2

Ti37Al63 and Ti53Al47 thin films are deposited onto SiO2 by sputtering and then annealed to investigate their properties for applications in high-temperature electronics. The films show good thermal stability and reasonable electrical resistivity. Different microstructures and phases are obtained as...

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Veröffentlicht in:	Scripta materialia 2004-02, Vol.50 (4), p.517-521
Hauptverfasser:	KIM, H. C, THEODORE, N. D, GADRE, K. S, ALFORD, T. L
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Metals. Metallurgy Physics Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
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Beschreibung
Zusammenfassung:	Ti37Al63 and Ti53Al47 thin films are deposited onto SiO2 by sputtering and then annealed to investigate their properties for applications in high-temperature electronics. The films show good thermal stability and reasonable electrical resistivity. Different microstructures and phases are obtained as different film compositions and anneal conditions are used.
ISSN:	1359-6462 1872-8456
DOI:	10.1016/j.scriptamat.2003.10.022