Dual Atoms (Fe, F) Co-Doping Inducing Electronic Structure Modulation of NiO Hollow Flower-Spheres for Enhanced Oxygen Evolution/Sulfion Oxidation Reaction Performance
Heteroatoms Fe, F co-doped NiO hollow spheres (Fe, F-NiO) are designed, which simultaneously integrate promoted thermodynamics by electronic structure modulation with boosted reaction kinetics by nano-architectonics. Benefiting from the electronic structure co-regulation of Ni sites by introducing F...
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Veröffentlicht in: | Small (Weinheim an der Bergstrasse, Germany) Germany), 2023-09, Vol.19 (38), p.e2302055-e2302055 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Heteroatoms Fe, F co-doped NiO hollow spheres (Fe, F-NiO) are designed, which simultaneously integrate promoted thermodynamics by electronic structure modulation with boosted reaction kinetics by nano-architectonics. Benefiting from the electronic structure co-regulation of Ni sites by introducing Fe and F atoms in NiO , as the rate-determined step (RDS), the Gibbs free energy of OH* intermediates (ΔG
) for Fe, F-NiO catalyst is significantly decreased to 1.87 eV for oxygen evolution reaction (OER) compared with pristine NiO (2.23 eV), which reduces the energy barrier and improves the reaction activity. Besides, densities of states (DOS) result verifies the bandgap of Fe, F-NiO(100) is significantly decreased compared with pristine NiO(100), which is beneficial to promote electrons transfer efficiency in electrochemical system. Profiting by the synergistic effect, the Fe, F-NiO hollow spheres only require the overpotential of 215 mV for OER at 10 mA cm
and extraordinary durability under alkaline condition. The assembled Fe, F-NiO||Fe-Ni
P system only needs 1.51 V to reach 10 mA cm
, also exhibits outstanding electrocatalytic durability for continuous operation. More importantly, replacing the sluggish OER by advanced sulfion oxidation reaction (SOR) not only can realize the energy saving H
production and toxic substances degradation, but also bring additional economic benefits. |
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ISSN: | 1613-6810 1613-6829 |
DOI: | 10.1002/smll.202302055 |