AlGaInN/AlGaInP Two-Wavelength Laser Diodes Fabricated by Wafer-Level Transferring Technique
An integrated two-wavelength laser diode (TWLD) which emits 405-nm-band and 650-nm-band laser beams from a single chip has been realized for the first time. The TWLD was fabricated by transferring a GaN-based laser diode (LD) onto an AlGaInP-based LD using a laser lift-off technique. Threshold curre...
Gespeichert in:
Veröffentlicht in: | Japanese Journal of Applied Physics 2004-02, Vol.43 (No. 2A), p.L136-L138 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | An integrated two-wavelength laser diode (TWLD) which emits 405-nm-band and 650-nm-band laser beams from a single chip has been realized for the first time. The TWLD was fabricated by transferring a GaN-based laser diode (LD) onto an AlGaInP-based LD using a laser lift-off technique. Threshold currents in laser operations were 150 mA and 50 mA for the wavelengths of 403 nm and 652 nm, resp. The GaN-based LD maintained its intrinsic property throughout the transfer onto the AlGaInP-based LD. The distance between two emission spots was approximately 6 mu m. Such a close spot distance allows the optical components of the pickup to be simplified. 8 refs. |
---|---|
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.43.L136 |