Dialkylcarbamato magnesium cluster complexes: precursors to the single-source chemical vapour deposition of high quality MgO thin films

Single source chemical vapour deposition (SSCVD) is a useful technique for preparing thin films, offering the simplicity of having all film components contained within the one molecule. However, the molecules currently used for SSCVD of MgO films are inconvenient due to high reactivity or expense. The use of a novel hexameric diethylcarbamato complex Mg6(O2CNEt2)12 as a single source precursor for MgO deposition is reported. This precursor is simple to prepare, has suitable volatility at moderate temperatures, and SSCVD leads to high quality MgO films at deposition temperatures near 500 C. Film analysis by XPS, XRD and SEM revealed a low carbon contamination and a film morphology that makes it suitable for use as a buffer layer between substrates and perovskite thin film coatings in electronic device construction. 24 refs.